LOCAL-FIELD METHOD FOR RESISTIVITY AND ELECTROMIGRATION IN METALLIC MICROSTRUCTURES - APPLICATION TO THIN-FILMS

被引：33
作者：
CHU, CS [1 ]
SORBELLO, RS [1 ]
机构：
[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201
来源：
PHYSICAL REVIEW B | 1988年 / 38卷 / 11期
关键词：
D O I：
10.1103/PhysRevB.38.7260
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：7260 / 7274
页数：15
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