THE PROPERTIES OF ALUMINUM THIN-FILMS SPUTTER DEPOSITED AT ELEVATED-TEMPERATURES

被引：49
作者：
INOUE, M
HASHIZUME, K
TSUCHIKAWA, H
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575298
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：1636 / 1639
页数：4
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