EFFECT OF HIGH SUBSTRATE TEMPERATURES OF CRYSTALLINE GROWTH OF AL2O3 FILMS DEPOSITED BY REACTIVE EVAPORATION

被引：6
作者：
CHEN, Z
JIN, MC
机构：
[1] Center for Materials Analysis, Department of Materials Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 610054, SiChuan
来源：
JOURNAL OF MATERIALS SCIENCE LETTERS | 1992年 / 11卷 / 15期
关键词：
D O I：
10.1007/BF00729749
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：1023 / 1025
页数：3
相关论文
共 16 条
[1]  
ALWITT RS, 1971, J ELECTROCHEM SOC, V118, P1703
[2]   ALUMINA DEPOSITION BY ACTIVATED REACTIVE EVAPORATION [J].
BUNSHAH, RF ;
SCHRAMM, RJ .
THIN SOLID FILMS, 1977, 40 (JAN) :211-216
[3]   HUMIDITY SENSORS WITH REACTIVELY EVAPORATED AL2O3 FILMS AS POROUS DIELECTRICS [J].
CHEN, Z ;
JIN, MC ;
ZHEN, C .
SENSORS AND ACTUATORS B-CHEMICAL, 1990, 2 (03) :167-171
[4]   PROPERTIES OF MODIFIED ANODIC-SPARK-DEPOSITED ALUMINA POROUS CERAMIC FILMS AS HUMIDITY SENSORS [J].
CHEN, Z ;
JIN, MC ;
ZHEN, C ;
CHEN, GH .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1991, 74 (06) :1325-1330
[5]  
CHEN Z, 1992, UNPUB 27TH ANN M HOU
[6]  
DASILVA EM, 1969, J ELECTROCHEM SOC, V109, P12
[7]   SURFACE-ADSORPTION OF WATER-VAPOR ON HYDRATED LAYERS OF AL2O3 [J].
EMMER, I ;
HAJEK, Z ;
REPA, P .
SURFACE SCIENCE, 1985, 162 (1-3) :303-309
[8]   PRELIMINARY INVESTIGATIONS OF REACTIVELY EVAPORATED ALUMINUM OXIDE FILMS ON SILICON [J].
FERRIEU, E ;
PRUNIAUX, B .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) :1008-+
[9]   STABILITY OF RF-SPUTTERED ALUMINUM-OXIDE [J].
GARDNER, RA ;
PETERSON, PJ ;
KENNEDY, TN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05) :1139-1145
[10]   A12O3 FILMS PREPARED BY ELECTRON-BEAM EVAPORATION OF HOT-PRESSED A12O3 IN OXYGEN AMBIENT [J].
HOFFMAN, D ;
LEIBOWITZ, D .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (01) :107-+
12