SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY

被引：78

作者：

GEIS, MW

RANDALL, JN

DEUTSCH, TF

DEGRAFF, PD

KROHN, KE

STERN, LA

机构：

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 01期

关键词：

D O I：

10.1063/1.94126

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：74 / 76

页数：3

共 17 条

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