SELF-DEVELOPING RESIST WITH SUBMICROMETER RESOLUTION AND PROCESSING STABILITY

被引：78
作者：
GEIS, MW
RANDALL, JN
DEUTSCH, TF
DEGRAFF, PD
KROHN, KE
STERN, LA
机构：
来源：
APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 01期
关键词：
D O I：
10.1063/1.94126
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：74 / 76
页数：3
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