INFRARED REFLECTIVITY OF N ON N+ SI WAFERS

被引：24

作者：

ABE, T

KATO, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1965年 / 4卷 / 10期

关键词：

D O I：

10.1143/JJAP.4.742

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：742 / &

共 17 条

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