Analytical modeling of drain current and RF performance for double-gate fully depleted nanoscale SOI MOSFETs

被引:3
作者
Sharma, Rajiv [1 ]
Pandey, Sujata [2 ]
Jain, Shail Bala [1 ]
机构
[1] Guru Gobind Singh Indraprastha Univ, Dept Elect & Commun Engn, Delhi, India
[2] Amity Univ, Dept Elect & Commun Engn, Sector 125, Noida, India
关键词
double-gate; fully depleted; silicon-on-insulator; Poisson's equation; radio frequency; ATLAS;
D O I
10.1088/1674-4926/33/2/024001
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A new 2D analytical drain current model is presented for symmetric double-gate fully depleted nanoscale SOI MOSFETs. Investigation of device parameters like transconductance for double-gate fully depleted nanoscale SOI MOSFETs is also carried out. Finally this work is concluded by modeling the cut-off frequency, which is one of the main figures of merit for analog/RF performance for double-gate fully depleted nanoscale SOI MOSFETs. The results of the modeling are compared with those obtained by a 2D ATLAS device simulator to verify the accuracy of the proposed model.
引用
收藏
页数:8
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