GROWTH AND ELECTRICAL-PROPERTIES OF PLASMA-SPRAYED SILICON

被引：14

作者：

SURYANARAYANAN, R

BRUN, G

AKANI, M

机构：

[1] CNRS, Lab de Physique des Solides,, Meudon, Fr, CNRS, Lab de Physique des Solides, Meudon, Fr

来源：

THIN SOLID FILMS | 1984年 / 119卷 / 01期

关键词：

This work was supported by contracts from Electricitt de France and ProgrammeI nterdisciplinairesu r I’EnergieS olaire. We shouldl ike to thankM r. J. Clementf or carefullyp olishingo ur samplesa nd Mme. M. RommeluereM; me C. Grattepaina nd Mme. M. Miloche for EPMA; SIMS and scanninge lectronm icroscopya nalysesre spectivelyW. e appreciatev ery much the provision of data on the Raman microprobeb y Dr. Huong. We are thankful for the helpful and encouraginga dviceb y Dr. Y. Marfaing and Dr. M. Rodot. We wish to thankD r. T. T. Meek of Los Alamosf or pointingo ut thep atent work by Janowieckie t a1.4;

D O I：

10.1016/0040-6090(84)90158-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：67 / 73

页数：7

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[9]

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