CHEMICAL CLEANING OF INP SURFACES - OXIDE COMPOSITION AND ELECTRICAL-PROPERTIES

被引：82
作者：
GUIVARCH, A
LHARIDON, H
PELOUS, G
HOLLINGER, G
PERTOSA, P
机构：
[1] UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
[2] UNIV LYON 1,INST NATL PHYS NUCL & PHYS PARTICULES,F-69622 VILLEURBANNE,FRANCE
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 04期
关键词：
D O I：
10.1063/1.333207
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1139 / 1148
页数：10
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