SUBNANOMETER ALIGNMENT SYSTEM FOR X-RAY-LITHOGRAPHY

被引：11
|
作者：
ZHOU, H
FELDMAN, M
BASS, R
机构：
[1] LOUISIANA STATE UNIV,CTR ADV MICROSTRUCT & DEVICES,BATON ROUGE,LA 70803
[2] USN,RES LAB,NANOELECTR PROC FACIL,WASHINGTON,DC 20375
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587608
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3261 / 3264
页数：4
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