AN X-RAY STEPPER FOR SYNCHROTRON RADIATION LITHOGRAPHY

被引:12
作者
KOUNO, E [1 ]
TANAKA, Y [1 ]
IWATA, J [1 ]
TASAKI, Y [1 ]
KAKIMOTO, E [1 ]
OKADA, K [1 ]
SUZUKI, K [1 ]
FUJII, K [1 ]
NOMURA, E [1 ]
机构
[1] NEC CORP,MICROELECTR RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词
D O I
10.1116/1.584101
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2135 / 2138
页数:4
相关论文
共 50 条
  • [41] X-ray microscopy with synchrotron radiation
    Chris Jacobsen
    Janos Kirz
    Nature Structural Biology, 1998, 5 : 650 - 653
  • [42] Characterization of the surface contamination of deep X-ray lithography mirrors exposed to synchrotron radiation
    Achenbach, Sven
    Wells, Garth
    Shen, Chen
    JOURNAL OF SYNCHROTRON RADIATION, 2018, 25 : 729 - 737
  • [43] Synchrotron-radiation-induced formation of salt particles on an X-ray lithography mask
    Utsumi, Y
    Takahashi, J
    Hosokawa, T
    JOURNAL OF SYNCHROTRON RADIATION, 1998, 5 : 1141 - 1143
  • [44] Performance of the IBM synchrotron X-ray source for lithography
    Archie, Chas
    IBM Journal of Research and Development, 1993, 37 (03): : 373 - 384
  • [45] Deep X-ray Lithography beamline at the Kurchatov Synchrotron Radiation Source: First results
    Artemiev, A.N.
    Bushev, I.N.
    Kolyasnikov, V.A.
    Kovachov, G.A.
    Latish, O.E.
    Martynenko, V.V.
    Moryakov, V.P.
    Nikitin, B.I.
    Odintsov, D.G.
    Peredkov, S.S.
    Rakhimbabaev, T.Y.
    Stankevitch, V.G.
    Tzvid, E.S.
    Schmidt, M.
    Schmidt, A.
    Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1998, 405 (2-3): : 496 - 499
  • [46] DEVELOPMENT OF A SILICON NITRIDE MASK TECHNOLOGY FOR SYNCHROTRON RADIATION X-RAY LITHOGRAPHY.
    Visser, C.C.G.
    Uglow, J.E.
    Burns, D.W.
    Wells, G.
    Redaelli, R.
    Cerrina, F.
    Guckel, H.
    Nuclear instruments and methods in physics research, 1987, A266 (1-3): : 686 - 690
  • [47] Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation
    Litvina, SV
    Kanaev, VG
    Larionova, EG
    Glazunova, NV
    Gromova, LP
    Yurchenko, VI
    Timchenko, NA
    Mezentseva, LA
    Nazmov, VP
    Pindyurin, VF
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 426 - 428
  • [48] Deep X-ray Lithography beamline at the Kurchatov Synchrotron Radiation Source: First results
    Artemiev, AN
    Busheva, IN
    Kolyasnikov, VA
    Kovachov, GA
    Latish, OE
    Martynenko, VV
    Moryakov, VP
    Nikitin, BI
    Odintsov, DG
    Peredkov, SS
    Rakhimbabaev, TY
    Stankevitch, VG
    Tzvid, ES
    Schmidt, A
    Feiertag, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1998, 405 (2-3) : 496 - 499
  • [49] X-ray synchrotron radiation in medium
    Giani, S
    Bagulya, AV
    Grichine, VM
    PHYSICS LETTERS B, 1999, 460 (3-4) : 467 - 473
  • [50] X-RAY OPTICS FOR SYNCHROTRON RADIATION
    FREUND, AK
    SYNCHROTRON RADIATION IN STRUCTURAL BIOLOGY, 1989, 51 : 255 - 292