AUGER-ELECTRON SPECTROSCOPY AND SPUTTER AUGER ANALYSES OF THIN-FILMS OF SICX

被引：22
作者：
MORGEN, P
SEAWARD, KL
BARBEE, TW
机构：
[1] STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
[2] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期
关键词：
D O I：
10.1116/1.573262
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2108 / 2115
页数：8
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