LOW-TEMPERATURE FORMATION OF INSULATING LAYERS ON SILICIDES BY ANODIC-OXIDATION

被引：4

作者：

STRYDOM, WJ

LOMBAARD, JC

PRETORIUS, R

机构：

[1] CSIR,NATL ACCELERATOR CTR,VAN DE GRAAFF GRP,DIV ION SOLID INTERACT,FAURE 7131,SOUTH AFRICA

[2] UNIV STELLENBOSCH,DEPT PHYS,DIV SOLID STATE,STELLENBOSCH 7600,SOUTH AFRICA

来源：

SOLID-STATE ELECTRONICS | 1987年 / 30卷 / 09期

关键词：

Acknowledgements-We would like to expresso ur appre-ciationt o Dr D. T. Thompson; M anager; N ew Technology DepartmentJ; o hnson-Matthey ResearchC entre; Reading and Mr J. P. Smith; Johnson-Matthey; W adeville; f or the platinum and palladium used in this investigation.T he Foundation for Research and Development (Micro-electronicso) f the CSIR is also thankedf or their financial support;

D O I：

10.1016/0038-1101(87)90131-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

16

引用

收藏

页码：947 / 951

页数：5

相关论文

共 16 条

[1] ANODIC OXIDE-FILMS ON CRSI2 [J].

BARCZ, AJ ;

BARTUR, M ;

BANWELL, T ;

NICOLET, MA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (10) :2312-2316

[2] PROPERTIES OF SIO2 GROWN ON TI, CO, NI, PD, AND PT SILICIDES [J].

BARTUR, M ;

NICOLET, MA .

JOURNAL OF ELECTRONIC MATERIALS, 1984, 13 (01) :81-94

[3]

Chu W. K., 1978, BACKSCATTERING SPECT

[4] O18 STUDY OF SOURCE OF OXYGEN IN ANODIC OXIDATION OF SILICON AND TANTALUM IN SOME ORGANIC SOLVENTS [J].

CROSET, M ;

PETREANU, E ;

SAMUEL, D ;

AMSEL, G ;

NADAI, JP .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (05) :717-&

[5] ELECTRODE REACTIONS AND MECHANISM OF SILICON ANODIZATION IN N-METHYLACETAMIDE [J].

DUFFEK, EF ;

MYLROIE, C ;

BENJAMINI, EA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (09) :1042-1046

[6] MECHANISM OF THE ANODIC-OXIDATION OF SI AT CONSTANT VOLTAGE [J].

JAIN, GC ;

PRASAD, A ;

CHAKRAVARTY, BC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) :89-92

[7] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES [J].

JIANG, H ;

PETERSSON, CS ;

NICOLET, MA .

THIN SOLID FILMS, 1986, 140 (01) :115-129

[8] REFRACTORY SILICIDES FOR INTEGRATED-CIRCUITS [J].

MURARKA, SP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (04) :775-792

[9]

NICOLET MA, 1983, MICROSTRUCTURE SCI, pCH6

[10] REACTION OF THIN METAL-FILMS WITH SIO2 SUBSTRATES [J].

PRETORIUS, R ;

HARRIS, JM ;

NICOLET, MA .

SOLID-STATE ELECTRONICS, 1978, 21 (04) :667-&