ELECTRON-BEAM SYSTEMS FOR PRECISION MICRON AND SUB-MICRON LITHOGRAPHY

被引：9

作者：

WILSON, AD

机构：

来源：

PROCEEDINGS OF THE IEEE | 1983年 / 71卷 / 05期

关键词：

D O I：

10.1109/PROC.1983.12641

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：575 / 584

页数：10

共 10 条

[1]

BROERS AN, 1980, MICROCIRCUIT ENG, P73

[2]

CHANG THP, 1976, 7TH P INT C EL ION B, P392

[3]

COANE P, 1982, MICROCIRCUIT ENG C G

[4] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J].

HERRIOTT, DR ;

COLLIER, RJ ;

ALLES, DS ;

STAFFORD, JW .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :385-392

[5] FABRICATION AND TESTING OF SINGLE-CRYSTAL LANTHANUM HEXABORIDE ROD CATHODES [J].

HOHN, FJ ;

CHANG, THP ;

BROERS, AN ;

FRANKEL, GS ;

PETERS, ET ;

LEE, DW .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) :1283-1296

[6] EL-3 - A HIGH THROUGHPUT, HIGH-RESOLUTION E-BEAM LITHOGRAPHY TOOL [J].

MOORE, RD ;

CACCOMA, GA ;

PFEIFFER, HC ;

WEBER, EV ;

WOODARD, OC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :950-952

[7]

OZDEMIR FS, 1975, J VAC SCI TECHNOL, P1246

[8]

TROTEL J, 1977, J VAC SCI TECHNOL, P872

[9]

VARNELL GL, 1973, J VAC SCI TECHNO MAY, P1048

[10]

WARDLY GA, 1975, IEEE T ELECTRON DEVI, V11, P414

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