MO-SI MULTILAYERED FILMS FOR SOFT-X-RAY MIRRORS

Synthetic multilayered films with alternating Mo-Si layers were fabricated by electron beam evaporation in a high vacuum of 10(-8) Pa. They are designed according to a calculation based on a dynamical theory including absorption. A molybdenum buffer layer with a thickness of 50 nm was epitaxially grown on the substrate in order to obtain a smooth surface. The reflectivity of the first Bragg peak with Cu K-alpha radiation was determined as 28% while the calculated value was 54%. Silicon layers were grown as the amorphous and molybdenum layers as the polycrystalline state. The discrepancy between the observed and calculated reflectivity is due to both the interfacial roughness and the variation in the period.