INSITU OBSERVATION OF TANTALUM THIN-FILM OXIDATION

被引:0
|
作者
LUGOMER, S [1 ]
KERENOVIC, M [1 ]
STIPANCIC, M [1 ]
机构
[1] ELECTR FAC BANJA LUKA, Banja Luka, YUGOSLAVIA
来源
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 1984年 / 40卷
关键词
D O I
10.1107/S0108767384094125
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:C193 / C193
页数:1
相关论文
共 50 条
  • [1] COMPARATIVE INSITU STUDY OF TANTALUM THIN-FILM OXIDATION IN ISOTHERMAL AND NON-ISOTHERMAL CONDITIONS
    LUGOMER, S
    KERENOVIC, M
    STIPANICIC, M
    LEKIC, S
    VACUUM, 1988, 38 (01) : 15 - 19
  • [2] INSITU MBI REFLECTION OBSERVATION OF THIN TI FILM OXIDATION
    LUGOMER, S
    STIPANCIC, M
    PERSIN, A
    APPLIED OPTICS, 1983, 22 (21): : 3314 - 3316
  • [3] TANTALUM THIN-FILM RESISTORS
    DUCKWORTH, RG
    THIN SOLID FILMS, 1972, 10 (03) : 337 - +
  • [4] SUBSTRATES FOR TANTALUM THIN-FILM CIRCUITS
    BROWN, R
    AMERICAN CERAMIC SOCIETY BULLETIN, 1966, 45 (08): : 720 - &
  • [5] RELIABILITY OF TANTALUM THIN-FILM CAPACITORS
    NAKAMURA, M
    YAMAZAKI, J
    NISHIMURA, Y
    ELECTRONICS & COMMUNICATIONS IN JAPAN, 1972, 55 (06): : 91 - 98
  • [6] TANTALUM NITRIDE THIN-FILM CIRCUITS ON POLYIMIDE
    CHIBA, K
    TERADA, T
    USHIGOME, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (03) : C88 - C88
  • [7] THIN-FILM LENSES BASED ON TANTALUM PENTOXIDE
    AAGARD, RL
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1975, 65 (10) : 1222 - 1222
  • [8] RELIABILITY OF TANTALUM THIN-FILM CAPACITORS.
    Nakamura, Masashi
    Yamazaki, Junichiro
    Nishimura, Yasuro
    1600, (55):
  • [9] STABILITY OF TANTALUM NITRIDE THIN-FILM RESISTORS
    AU, CL
    ANDERSON, WA
    SCHMITZ, DA
    FLASSAYER, JC
    COLLINS, FM
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (06) : 1224 - 1232
  • [10] TANTALUM NITRIDE THIN-FILM CIRCUITS ON POLYIMIDE
    TERADA, T
    USHIGOME, M
    TAMAKI, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C72 - C72