ELECTRON-BEAM PROCESSING SYSTEMS (A STATE OF ART REVIEW)

被引：2

作者：

HATZAKIS, M ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

POLYMER ENGINEERING AND SCIENCE | 1974年 / 14卷 / 07期

关键词：

D O I：

10.1002/pen.760140710

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：516 / 517

页数：2

共 17 条

[1]

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[2]

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[9] EPOXIDE-CONTAINING POLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS [J].

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[10] POLYMERIC ELECTRON BEAM RESISTS [J].

KU, HY ;

SCALA, LC .

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