MODEL STUDIES ON PASSIVE METAL-ELECTRODES

被引：19

作者：

HURLEN, T

SIMON, C

WILHELMSEN, W

HORNKJOL, S

GULBRANDSEN, E

机构：

来源：

关键词：

D O I：

10.1016/0013-4686(89)87056-2

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：519 / 524

页数：6

共 30 条

[1] AHMED SM, 1972, OXIDES OXIDE FILMS, V1, pCH4
[2] THEORY OF THE OXIDATION OF METALS
CABRERA, N
MOTT, NF
[J]. REPORTS ON PROGRESS IN PHYSICS, 1948, 12 : 163 - 184
[3] INTERFACIAL PROPERTIES OF OXIDES USED AS ANODES IN THE ELECTROCHEMICAL TECHNOLOGY
DAGHETTI, A
LODI, G
TRASATTI, S
[J]. MATERIALS CHEMISTRY AND PHYSICS, 1983, 8 (01) : 1 - 90
[4] MIGRATION OF METAL AND OXYGEN DURING ANODIC FILM FORMATION
DAVIES, JA
DOMEIJ, B
PRINGLE, JPS
BROWN, F
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (07) : 675 - &
[5] Delahay P., 1965, DOUBLE LAYER ELECTRO
[6] Fehlner F. P., 1986, LOW TEMPERATURE OXID
[7] GERISCHER H, 1961, ADV ELECTROCHEMISTRY, V1, pCH4
[8] ELECTRON-TRANSFER REACTIONS AT SEMICONDUCTING ANODIC NIOBIUM OXIDE-FILMS
HEUSLER, KE
SCHULZE, M
[J]. ELECTROCHIMICA ACTA, 1975, 20 (03) : 237 - 244
[9] HOAR TP, 1959, MOD ASPECT ELECTROC, V2, pCH4
[10] PASSIVE BEHAVIOR OF HAFNIUM
HORNKJOL, S
[J]. ELECTROCHIMICA ACTA, 1988, 33 (03) : 337 - 340