SURFACE-REACTION ENHANCEMENT VIA LOW-ENERGY ELECTRON-BOMBARDMENT AND SECONDARY-ELECTRON EMISSION

被引：28
作者：
KUNZ, RR
MAYER, TM
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词：
D O I：
10.1116/1.583919
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：427 / 429
页数：3
相关论文
共 21 条
[1]   AES STUDY OF THE LOW-PRESSURE OXIDATION OF SI(100) - ELECTRON-BEAM EFFECTS [J].
CARRIERE, B ;
CHOUIYAKH, A ;
LANG, B .
SURFACE SCIENCE, 1983, 126 (1-3) :495-501
[2]   ION-ASSISTED AND ELECTRON-ASSISTED GAS-SURFACE CHEMISTRY - IMPORTANT EFFECT IN PLASMA-ETCHING [J].
COBURN, JW ;
WINTERS, HF .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3189-3196
[3]  
COLLOT P, 1985, THESIS U PARIS 7
[4]   ION-ENHANCED GAS-SURFACE CHEMISTRY - THE INFLUENCE OF THE MASS OF THE INCIDENT ION [J].
GERLACHMEYER, U ;
COBURN, JW ;
KAY, E .
SURFACE SCIENCE, 1981, 103 (01) :177-188
[5]   BROAD-BEAM ELECTRON SOURCE [J].
KAUFMAN, HR ;
ROBINSON, RS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (04) :1774-1778
[6]  
KAUFMAN HR, 1984, APPLICATIONS THEORY
[7]  
KERN W, 1970, RCA REV, V31, P187
[8]   ELECTRON-BEAM INDUCED EFFECTS ON GAS ADSORPTION UTILIZING AUGER-ELECTRON SPECTROSCOPY - CO AND O2 ON SI .1. ADSORPTION STUDIES [J].
KIRBY, RE ;
LICHTMAN, D .
SURFACE SCIENCE, 1974, 41 (02) :447-466
[9]   ELECTRON-BEAM INDUCED EFFECTS ON GAS ADSORPTION UTILIZING AUGER-ELECTRON SPECTROSCOPY - CO AND O2 ON SI .2. STRUCTURAL EFFECTS [J].
KIRBY, RE ;
DIEBALL, JW .
SURFACE SCIENCE, 1974, 41 (02) :467-474
[10]   SECONDARY-ELECTRON AND BACKSCATTERING MEASUREMENTS FOR POLYCRYSTALLINE COPPER WITH A SPHERICAL RETARDING-FIELD ANALYZER [J].
KOSHIKAWA, T ;
SHIMIZU, R .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1973, 6 (11) :1369-1380
123