DETERMINATION OF THE ENERGIES OF IMPURITY IONS IN A LOW-PRESSURE PLASMA USING PLASMA CHEMICAL ETCHING

被引：0
|
作者：
GIMZEWSKI, JK [1 ]
VEPREK, S [1 ]
机构：
[1] UNIV ZURICH,INST ANORGAN CHEM,CH-8057 ZURICH,SWITZERLAND
来源：
HELVETICA PHYSICA ACTA | 1983年 / 56卷 / 04期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：959 / 960
页数：2
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