ELECTRON-CYCLOTRON-RESONANT MICROWAVE PLASMA SYSTEM FOR THIN-FILM DEPOSITION

被引：20
作者：
MEJIA, SR
MCLEOD, RD
KAO, KC
CARD, HC
机构：
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1986年 / 57卷 / 03期
关键词：
D O I：
10.1063/1.1138915
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：493 / 496
页数：4
相关论文
共 8 条
[1]  
HUDGENS SJ, J NONCRYST SOLIDS
[2]  
KATO S, J NONCRYST SOLIDS
[3]   FORMATION KINETICS AND CONTROL OF MICROCRYSTALLITE IN MU-C-SI-H FROM GLOW-DISCHARGE PLASMA [J].
MATSUDA, A .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) :767-774
[4]  
MATSUO S, 1983, JPN J APPL PHYS, V22, P1210
[5]   THE EFFECTS OF DEPOSITION PARAMETERS ON A-SI-H FILMS FABRICATED BY MICROWAVE GLOW-DISCHARGE TECHNIQUES [J].
MEJIA, SR ;
MCLEOD, RD ;
KAO, KC ;
CARD, HC .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) :727-730
[6]  
MEJIA SR, J NONCRYST SOLIDS
[7]  
OSAKA Y, 1984, AMORPHOUS SEMICONDUC, V16, pCH2
[8]   MEASUREMENT OF POWER TRANSFER EFFICIENCY FROM MICROWAVE FIELD TO PLASMA UNDER ECR CONDITION [J].
SAKAMOTO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (11) :1993-1998
1