AN OVERVIEW OF THE MODIFIED CHEMICAL VAPOR-DEPOSITION (MCVD) PROCESS AND PERFORMANCE

被引：227
作者：
NAGEL, SR
MACCHESNEY, JB
WALKER, KL
机构：
来源：
IEEE JOURNAL OF QUANTUM ELECTRONICS | 1982年 / 18卷 / 04期
关键词：
D O I：
10.1109/JQE.1982.1071596
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：459 / 476
页数：18
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