AN OVERVIEW OF THE MODIFIED CHEMICAL VAPOR-DEPOSITION (MCVD) PROCESS AND PERFORMANCE

被引：227
作者：
NAGEL, SR
MACCHESNEY, JB
WALKER, KL
机构：
来源：
IEEE JOURNAL OF QUANTUM ELECTRONICS | 1982年 / 18卷 / 04期
关键词：
D O I：
10.1109/JQE.1982.1071596
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：459 / 476
页数：18
相关论文
共 143 条
[111]  
RUNK RB, 1978, FAL M EL SOC PITTSB, P365
[112]  
SARKAR A, 1981, IEEE COMMUN WORKSHOP
[113]   RAYLEIGH AND BRILLOUIN-SCATTERING IN K2O-SIO2 GLASSES [J].
SCHROEDER, J ;
MOHR, R ;
MACEDO, PB ;
MONTROSE, CJ .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1973, 56 (10) :510-514
[114]   OPTICAL-ABSORPTION OF TRANSITION-ELEMENTS IN VITREOUS SILICA [J].
SCHULTZ, PC .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1974, 57 (07) :309-313
[115]   FABRICATION OF OPTICAL-WAVEGUIDES BY THE OUTSIDE VAPOR-DEPOSITION PROCESS [J].
SCHULTZ, PC .
PROCEEDINGS OF THE IEEE, 1980, 68 (10) :1187-1190
[116]  
SCHULTZ PC, 1977, 11TH P INT C GLASS P, V3, P155
[117]  
SEIKAI S, 1979, 3RD IOOC WASH, P100
[118]  
Shibata N., 1980, Transactions of the Institute of Electronics and Communication Engineers of Japan, Section E (English), VE63, P837
[119]   THERMOPHORESIS - MASS-TRANSFER MECHANISM IN MODIFIED CHEMICAL VAPOR-DEPOSITION [J].
SIMPKINS, PG ;
GREENBERGKOSINSKI, S ;
MACCHESNEY, JB .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) :5676-5681
[120]   HIGH-RATE MCVD [J].
SIMPSON, JR ;
MACCHESNEY, JB ;
WALKER, KL .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 38-9 (MAY-) :831-836
6789101112131415