A FIELD-EMISSION E-BEAM SYSTEM FOR NANOMETER LITHOGRAPHY

被引：10

作者：

STEPHANI, D

KRATSCHMER, E

BENEKING, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582664

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1011 / 1013

页数：3

共 7 条

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[2]

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LEE, KL ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :946-949

[6] MATERIALS AND TECHNIQUES USED IN NANOSTRUCTURE FABRICATION [J].

MOLZEN, WW ;

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[7] PREPARATION OF X-RAY LITHOGRAPHY MASKS WITH LARGE AREA SANDWICH STRUCTURE MEMBRANE [J].

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