PHOTO-PROCESS OF TANTALUM OXIDE-FILMS AND THEIR CHARACTERISTICS

被引：62

作者：

MATSUI, M

OKA, S

YAMAGISHI, K

KUROIWA, K

TARUI, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 04期

关键词：

D O I：

10.1143/JJAP.27.506

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：506 / 511

页数：6

共 10 条

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[9]

SHINRIKI H, 1986, IEDM, P684

[10] PHOTO-CVD OF TANTALUM OXIDE FILM FROM PENTAMETHOXY TANTALUM FOR VLSI DYNAMIC MEMORIES [J].

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (04) :L306-L308

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