PULSED LASER DEPOSITION - FUTURE-DIRECTIONS

被引：35
作者：
VENKATESAN, T
WU, XD
MUENCHAUSEN, R
PIQUE, A
机构：
[1] UNIV CALIF LOS ALAMOS SCI LAB,CTR EXPLORATORY RES & DEV,LOS ALAMOS,NM 87544
[2] NEOCERA INC,TECH STAFF,COLLEGE PK,MD
来源：
MRS BULLETIN | 1992年 / 17卷 / 02期
关键词：
D O I：
10.1557/S0883769400040628
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：54 / 58
页数：5
相关论文
共 23 条
[21]   LARGE CRITICAL CURRENT DENSITIES IN YBA2CU3O7-X THIN-FILMS MADE AT HIGH DEPOSITION RATES [J].
WU, XD ;
MUENCHAUSEN, RE ;
FOLTYN, S ;
ESTLER, RC ;
DYE, RC ;
GARCIA, AR ;
NOGAR, NS ;
ENGLAND, P ;
RAMESH, R ;
HWANG, DM ;
RAVI, TS ;
CHANG, CC ;
VENKATESAN, T ;
XI, XX ;
LI, Q ;
INAM, A .
APPLIED PHYSICS LETTERS, 1990, 57 (05) :523-525
[22]   EFFECT OF DEPOSITION RATE ON PROPERTIES OF YBA2CU3O7-DELTA SUPERCONDUCTING THIN-FILMS [J].
WU, XD ;
MUENCHAUSEN, RE ;
FOLTYN, S ;
ESTLER, RC ;
DYE, RC ;
FLAMME, C ;
NOGAR, NS ;
GARCIA, AR ;
MARTIN, J ;
TESMER, J .
APPLIED PHYSICS LETTERS, 1990, 56 (15) :1481-1483
[23]   PULSED LASER DEPOSITION OF STOICHIOMETRIC POTASSIUM-TANTALATE-NIOBATE FILMS FROM SEGMENTED EVAPORATION TARGETS [J].
YILMAZ, S ;
VENKATESAN, T ;
GERHARDMULTHAUPT, R .
APPLIED PHYSICS LETTERS, 1991, 58 (22) :2479-2481
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