EB60 - AN ADVANCED DIRECT WAFER EXPOSURE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR HIGH-THROUGHPUT, HIGH-PRECISION, SUBMICRON PATTERN WRITING

被引：13
|
作者：
FUJINAMI, M
SHIMAZU, N
HOSOKAWA, T
SHIBAYAMA, A
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词：
D O I：
10.1116/1.583928
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：61 / 65
页数：5
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