EB60 - AN ADVANCED DIRECT WAFER EXPOSURE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR HIGH-THROUGHPUT, HIGH-PRECISION, SUBMICRON PATTERN WRITING

被引：13

作者：

FUJINAMI, M

SHIMAZU, N

HOSOKAWA, T

SHIBAYAMA, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583928

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：61 / 65

页数：5

共 7 条

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[4]

Morita H., 1985, Microelectronic Engineering, V3, P53, DOI 10.1016/0167-9317(85)90009-7

[5] A HIGH-SPEED PATTERNING CONTROLLER FOR THE EB60 ELECTRON-BEAM LITHOGRAPHY SYSTEM [J].

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FUJINAMI, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :66-69

[6] DEPENDENCE OF MINIMUM LINEWIDTH ON ELECTRON-BEAM PROPERTIES IN SUBMICRON LITHOGRAPHY USING A RECTANGULAR BEAM [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (03) :682-685

[7] HIGH-SPEED FLAT GUIDE CERAMIC STAGE FOR ELECTRON-BEAM LITHOGRAPHY SYSTEM [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :280-284

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