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- [1] SPECTROSCOPIC STUDY ON POLYSILICON PLASMA-ETCHINGJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (11) : C441 - C441ENAMI, HMIZUKAMI, K
- [2] PATTERN PROFILE CONTROL OF POLYSILICON PLASMA-ETCHINGJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 16 - 19KIMIZUKA, MHIRATA, K
- [3] PLASMA-ETCHING OF ION-IMPLANTED POLYSILICONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (09) : 2716 - 2720KARULKAR, PCWIRZBICKI, MA
- [4] ANISOTROPIC HIGHLY SELECTIVE ELECTRON-CYCLOTRON RESONANCE PLASMA-ETCHING OF POLYSILICONJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 1303 - 1306GADGIL, PKDANE, DMANTEI, TD
- [5] PLASMA-ETCHING OF POLYSILICON NITRIDE POLYSILICON SANDWICH STRUCTURE FOR SENSOR APPLICATIONSMICROELECTRONIC ENGINEERING, 1993, 21 (1-4) : 341 - 344LI, YXLAROS, MSARRO, PMFRENCH, PJWOLFFENBUTTEL, RF
- [6] PLASMA-ETCHING OF POLYSILICON DOPED BY ION-IMPLANTATIONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C126 - C126KARULKAR, PCWIRZBICKI, MA
- [7] STATISTICAL PROCESS-CONTROL IN RELATION TO PLASMA-ETCHING OF POLYSILICONABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1988, 195 : A8 - ACSCWING, JM
- [9] MICROTRENCH FORMATION IN POLYSILICON PLASMA-ETCHING OVER THIN GATE OXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (08) : 2395 - 2401DALTON, TJARNOLD, JCSAWIN, HHSWAN, SCORLISS, D
- [10] Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rateJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (06):Hirota, KosaItabashi, NaoshiTanaka, Junichi