ANNEALING OF PLASMA SILICON OXYNITRIDE FILMS

被引：80
|
作者：
DENISSE, CMM [1 ]
TROOST, KZ [1 ]
HABRAKEN, FHPM [1 ]
VANDERWEG, WF [1 ]
HENDRIKS, M [1 ]
机构：
[1] ADV SEMICOND MAT EUROPE BV,3723 BS BILTHOVEN,NETHERLANDS
来源：
JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 07期
关键词：
D O I：
10.1063/1.337118
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2543 / 2547
页数：5
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