ANNEALING OF PLASMA SILICON OXYNITRIDE FILMS

被引:80
作者
DENISSE, CMM [1 ]
TROOST, KZ [1 ]
HABRAKEN, FHPM [1 ]
VANDERWEG, WF [1 ]
HENDRIKS, M [1 ]
机构
[1] ADV SEMICOND MAT EUROPE BV,3723 BS BILTHOVEN,NETHERLANDS
关键词
D O I
10.1063/1.337118
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:2543 / 2547
页数:5
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