MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY

被引：96
作者：
KYSER, DF
VISWANATHAN, NS
机构：
[1] IBM CORP,RES DIV,SAN JOSE,CA 95193
[2] IBM CORP,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.568524
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1305 / 1308
页数：4
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