PLASMA DEPOSITION OF SIO2 GATE INSULATORS FOR ALPHA-SI THIN-FILM TRANSISTORS

被引：10
|
作者：
DRESNER, J
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 02期
关键词：
D O I：
10.1116/1.584062
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：517 / 523
页数：7
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