THE REACTIVE SPUTTERING OF TANTALUM OXIDE - COMPOSITIONAL UNIFORMITY, PHASES, AND TRANSPORT MECHANISMS

被引：12

作者：

REITH, TM ^{[1
]}

FICALORA, PJ ^{[1
]}

机构：

[1] SYRACUSE UNIV, SYRACUSE, NY 13210 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1983年 / 1卷 / 03期

关键词：

D O I：

10.1116/1.572023

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1362 / 1369

页数：8

共 26 条

[1]

[Anonymous], J LESS COMMON MET

[2]

BARRINGTON AE, 1963, HIGH VACUUM ENG, P13

[3]

BEHRNDT KH, 1964, THIN FILMS, P1

[4] COMBINED SIMS, AES, AND XPS INVESTIGATIONS OF TANTALUM OXIDE LAYERS [J].

BISPINCK, H ;

GANSCHOW, O ;

WIEDMANN, L ;

BENNINGHOVEN, A .

APPLIED PHYSICS, 1979, 18 (02) :113-117

[5] REACTIVE ION-BEAM SPUTTERING OF THIN-FILMS OF LEAD, ZIRCONIUM AND TITANIUM [J].

CASTELLANO, RN .

THIN SOLID FILMS, 1977, 46 (02) :213-221

[6] PREFERENTIAL SPUTTERING OF BINARY-ALLOYS WITH DIFFUSION - EQUILIBRIUM DISTRIBUTION [J].

COLLINS, R .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1978, 37 (1-2) :13-19

[7] STRUCTURE AND ELECTRICAL PROPERTIES OF TA FILMS SPUTTERED IN AR-O2 [J].

FEINSTEIN, LG ;

GERSTENBERG, D .

THIN SOLID FILMS, 1972, 10 (01) :79-+

[8] JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA [J].

GREINER, HJ .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) :5151-&

[9] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J].

HELLER, J .

THIN SOLID FILMS, 1973, 7 (02) :163-176

[10]

HELMS CR, COMMUNICATION

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