PLASMA-ETCHING OF SIO2-FILMS FOR CONTACT HOLES IN VLSI

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作者：
ALBIN, S
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来源：
GEC JOURNAL OF RESEARCH | 1983年 / 1卷 / 03期
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：178 / 183
页数：6
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