SPUTTERING OF COBALT AND CHROMIUM BY ARGON AND XENON IONS NEAR THE THRESHOLD ENERGY REGION

被引:4
作者
HANDOO, AK [1 ]
RAY, PK [1 ]
机构
[1] TUSKEGE UNIV,SCH ENGN & ARCHITECTURE,ELECT PROP LAB,TUSKEGEE,AL 36088
关键词
D O I
10.1139/p93-024
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Sputtering yields of cobalt and chromium bv argon and xenon ions with energies below 50 eV are reported. The targets were electroplated on copper substrates. Measurable sputtering yields were obtained from cobalt with ion energies as low as 10 eV. The ion beams were produced by an ion gun. A radioactive tracer technique was used for the quantitative measurement of the sputtering yield. Co-57 and Cr-51 were used as tracers. The yield-energy curves are observed to be concave, which brings into question the practice of finding threshold energies by linear extrapolation.
引用
收藏
页码:155 / 158
页数:4
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