EFFECTS OF ANNEALING ON INFRARED AND THERMAL-EFFUSION SPECTRA OF SPUTTERED A-SI-H ALLOYS

被引:15
|
作者
TALUKDER, G [1 ]
CORNISH, JCL [1 ]
JENNINGS, P [1 ]
HEFTER, GT [1 ]
CLARE, BW [1 ]
LIVINGSTONE, J [1 ]
机构
[1] UNIV WESTERN AUSTRALIA,DEPT PHYS,NEDLANDS,WA 6009,AUSTRALIA
关键词
D O I
10.1063/1.350723
中图分类号
O59 [应用物理学];
学科分类号
摘要
Infrared spectroscopy and thermal effusion have been used to study the nature of the silicon-hydrogen bond in sputtered a-Si:H alloys. The samples were prepared by reactive sputtering under different deposition conditions to produce varying hydrogen contents. The Fourier transform infrared spectra have been analyzed using the simplex algorithm to deconvolute the component peaks. This technique has been applied separately to both the stretching- and bending-mode regions of the infrared absorption spectra. Studies have been made of the effects of annealing on both the infrared and the thermal evolution spectra of hydrogen. The results indicate a redistribution and transformation of different bonding configurations due to annealing. A comparative study is presented of the thermal-effusion spectra for partial and total degassing with the infrared spectra taken before and after each phase of degassing.
引用
收藏
页码:403 / 409
页数:7
相关论文
共 50 条
  • [21] LUMINESCENCE RECOMBINATION IN DOPED MAGNETRON SPUTTERED A-SI-H
    RHODES, AJ
    BHAT, PK
    SEARLE, TM
    AUSTIN, IG
    ALLISON, J
    JOURNAL OF LUMINESCENCE, 1984, 31-2 (DEC) : 457 - 459
  • [22] PHOTOCONDUCTIVITY OF A-SI-H IN THE INFRARED RANGE
    VAVILOV, VS
    KAZANSKII, AG
    KUROVA, IA
    ORMONT, NN
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1983, 17 (07): : 829 - 830
  • [23] EFFECT OF ANNEALING ON THE OPTICAL GAP OF A-SI-H
    DENEUVILLE, A
    MINI, A
    BRUYERE, JC
    JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1981, 14 (30): : 4531 - 4540
  • [24] CHANGE IN FILM STRESS OF A-SI-H BY ANNEALING
    ITO, T
    FUJIMURA, N
    NAKAYAMA, Y
    TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1986, 27 (10): : 789 - 790
  • [25] ACCUMULATION AND ANNEALING OF IMPLANTATION DAMAGE IN A-SI-H
    STITZL, H
    KROTZ, G
    MULLER, G
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1991, 53 (03): : 235 - 240
  • [26] INTERFACE DEFECTS IN SPUTTERED A-SI-H/A-C-H MULTILAYERS
    HE, DY
    ZHANG, FQ
    CUI, JZ
    CHEN, GH
    PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1987, 142 (01): : K35 - K37
  • [27] LIGHT-INDUCED EFFECTS AND STABILITY IN A-SI-H AND RELATED ALLOYS
    SHIMIZU, T
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 164 : 163 - 168
  • [28] MICROVOIDS IN A-SI-H AND A-SIGE-H ALLOYS
    MURAMATSU, S
    SUZUKI, R
    WEI, L
    TANIGAWA, S
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1994, 34 (1-4) : 525 - 531
  • [29] DOPING EFFECTS IN A-SI-H
    BEYER, W
    OVERHOF, H
    SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 257 - 307
  • [30] COMMENTS ON THE INTERPRETATION OF DLTS SPECTRA OF A-SI-H
    KOCKA, J
    STIKA, O
    STUCHLIK, J
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1983, 76 (02): : K217 - K220