DIRECT MEASUREMENT OF CONTAMINATION AND ETCHING RATES IN AN ELECTRON-BEAM

被引：30

作者：

EGERTON, RF ^{[1
]}

ROSSOUW, CJ ^{[1
]}

机构：

[1] UNIV OXFORD,DEPT MET & SCI MAT,OXFORD OX1 3PH,ENGLAND

来源：

关键词：

D O I：

10.1088/0022-3727/9/4/016

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：659 / 663

页数：5

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