NATIVE-OXIDE STRIPE-GEOMETRY ALXGA1-XAS-GAAS QUANTUM-WELL HETEROSTRUCTURE LASERS

被引:87
作者
DALLESASSE, JM [1 ]
HOLONYAK, N [1 ]
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
关键词
D O I
10.1063/1.104645
中图分类号
O59 [应用物理学];
学科分类号
摘要
Data are presented on the room-temperature continuous (cw) operation of native-oxide single-stripe Al(x)Ga(l)-xAs-GaAs quantum well heterostructure (QWH) lasers. The device quality native oxide is produced by the conversion of high Al composition Al(x)Ga(l)-xAs (chi-approximately 0.8) confining layers via H2O vapor oxidation (400-degrees-C) in a N2 carrier gas. The 10-mu-m-wide cw 300 K QWH lasers, which are fabricated by simplified processing, have excellent spectral quality and have been operated to powers in excess of 100 mW per facet.
引用
收藏
页码:394 / 396
页数:3
相关论文
共 7 条
[1]   STABILITY OF ALAS IN ALXGA1-XAS-ALAS-GAAS QUANTUM-WELL HETEROSTRUCTURES [J].
DALLESASSE, JM ;
GAVRILOVIC, P ;
HOLONYAK, N ;
KALISKI, RW ;
NAM, DW ;
VESELY, EJ ;
BURNHAM, RD .
APPLIED PHYSICS LETTERS, 1990, 56 (24) :2436-2438
[2]   ENVIRONMENTAL DEGRADATION OF ALXGA1-XAS-GAAS QUANTUM-WELL HETEROSTRUCTURES [J].
DALLESASSE, JM ;
ELZEIN, N ;
HOLONYAK, N ;
HSIEH, KC ;
BURNHAM, RD ;
DUPUIS, RD .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (05) :2235-2238
[3]   HYDROLYZATION OXIDATION OF ALXGA1-XAS-ALAS-GAAS QUANTUM-WELL HETEROSTRUCTURES AND SUPERLATTICES [J].
DALLESASSE, JM ;
HOLONYAK, N ;
SUGG, AR ;
RICHARD, TA ;
ELZEIN, N .
APPLIED PHYSICS LETTERS, 1990, 57 (26) :2844-2846
[4]  
DUPUIS RD, 1979, P INT S GAAS RELATED, P1
[5]   SURFACE PROTECTION AND SELECTIVE MASKING DURING DIFFUSION IN SILICON [J].
FROSCH, CJ ;
DERICK, L .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (09) :547-552
[6]   METALORGANIC CHEMICAL VAPOR-DEPOSITION OF III-V SEMICONDUCTORS [J].
LUDOWISE, MJ .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (08) :R31-R55
[7]  
[No title captured]