HIGH-SPEED REACTIVE ION ETCHING USING A MAGNETRON DISCHARGE

被引：0

作者：

HORIIKE, Y

OKANO, H

机构：

来源：

JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS | 1984年 / 13卷

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暂无

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：249 / &

共 19 条

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[9]

Horiike Y., 1982, Microcircuit Engineering 82. International Conference on Microlithography, P203

[10]

HORIIKE Y, 1984, MICROSTRUCTURE SCI, V8, P448

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