SELF-INTERSTITIAL AND VACANCY CONTRIBUTIONS TO SILICON SELF-DIFFUSION DETERMINED FROM THE DIFFUSION OF GOLD IN SILICON

被引：53

作者：

MOREHEAD, F ^{[1
]}

STOLWIJK, NA ^{[1
]}

MEYBERG, W ^{[1
]}

GOSELE, U ^{[1
]}

机构：

[1] MAX PLANCK INST MET RES,INST PHYS,D-7000 STUTTGART 80,FED REP GER

来源：

APPLIED PHYSICS LETTERS | 1983年 / 42卷 / 08期

关键词：

D O I：

10.1063/1.94074

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：690 / 692

页数：3

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