HETEROEPITAXIAL YBA2CU3O7-X-SRTIO3-YBA2CU3O7-X TRILAYERS EXAMINED BY TRANSMISSION ELECTRON-MICROSCOPY

被引:23
作者
TIDJANI, ME
GRONSKY, R
KINGSTON, JJ
WELLSTOOD, FC
CLARKE, J
机构
[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT SCI,NATL CTR ELECTRON MICROSCOPY,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY,DEPT PHYS,BERKELEY,CA 94720
[3] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT SCI,CTR ADV MAT,BERKELEY,CA 94720
关键词
D O I
10.1063/1.104541
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report high-resolution transmission electron microscopy and electron diffraction studies of the heteroepitaxial superconductor-insulator-superconductor system YBa2Cu3O7-x-SrTiO3-YBa2Cu3O7-x deposited on polished (001) MgO substrates by in situ laser ablation. The resulting films grow epitaxially and consistently preserve a parallel orientation between the close-packed (001) YBa2Cu3O7-x planes and (001)SrTiO3 planes over the entire trilayer, even in the presence of ledges or steps along vicinal interfaces. Although the interface regions showed strain occasionally relieved by stacking faults, they were free of disorder and any evidence of impurity phases. The observed epitaxial growth is very likely responsible for the excellent electrical properties found in similarly constructed multilayer interconnects.
引用
收藏
页码:765 / 767
页数:3
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