A HIGH-SPEED, HIGH-PRECISION ELECTRON-BEAM LITHOGRAPHY SYSTEM (ELECTRON OPTICS)

被引：2

作者：

SAITOU, N ^{[1
]}

OKUMURA, M ^{[1
]}

MATSUOKA, G ^{[1
]}

MATSUZAKA, T ^{[1
]}

KOMODA, T ^{[1
]}

SAKITANI, Y ^{[1
]}

机构：

[1] HITACHI LTD,NAKA WORKS,KATSUTA,IBARAKI 312,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583300

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：98 / 101

页数：4

共 6 条

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[3] A SIMPLIFIED FOCUSING AND DEFLECTION SYSTEM WITH VERTICAL BEAM LANDING [J].

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[4]

MURAI F, 1983, P IEEE INT ELECTRON, P558

[5] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :887-890

[6] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .2. ELECTRON OPTICS [J].

SAITOU, N ;

OZASA, S ;

KOMODA, T ;

TATSUNO, G ;

UNO, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1087-1093

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