EFFECT OF THERMAL NITRIDATION PROCESSES ON BORON AND PHOSPHORUS DIFFUSION IN (100) SILICON

被引：72

作者：

FAHEY, P

DUTTON, RW

MOSLEHI, M

机构：

来源：

关键词：

D O I：

10.1063/1.94445

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：683 / 685

页数：3

共 12 条

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[9]

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