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MOSFET AND MOS CAPACITOR RESPONSES TO IONIZING-RADIATION
被引:67
作者
:
BENEDETTO, JM
论文数:
0
引用数:
0
h-index:
0
BENEDETTO, JM
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
BOESCH, HE
机构
:
来源
:
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
|
1984年
/ 31卷
/ 06期
关键词
:
D O I
:
10.1109/TNS.1984.4333530
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1461 / 1466
页数:6
相关论文
共 18 条
[1]
BOESCH HE, 1982, IEEE T NUCL SCI, V29, P1446
[2]
CHARGE PUMPING IN MOS DEVICES
[J].
BRUGLER, JS
论文数:
0
引用数:
0
h-index:
0
机构:
Stanford University, Stanford, Calif.
BRUGLER, JS
;
JESPERS, PGA
论文数:
0
引用数:
0
h-index:
0
机构:
Stanford University, Stanford, Calif.
JESPERS, PGA
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1969,
ED16
(03)
:297
-+
[3]
APPARENT INTERFACE STATE DENSITY INTRODUCED BY SPATIAL FLUCTUATIONS OF SURFACE POTENTIAL IN AN MOS STRUCTURE
[J].
CASTAGNE, R
论文数:
0
引用数:
0
h-index:
0
CASTAGNE, R
;
VAPAILLE, A
论文数:
0
引用数:
0
h-index:
0
VAPAILLE, A
.
ELECTRONICS LETTERS,
1970,
6
(22)
:691
-+
[4]
FREQUENCY AND TEMPERATURE TESTS FOR LATERAL NONUNIFORMITIES IN MIS CAPACITORS
[J].
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
CHANG, CC
;
JOHNSON, WC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
JOHNSON, WC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(10)
:1249
-1255
[5]
GATE-WIDTH DEPENDENCE OF RADIATION-INDUCED INTERFACE TRAPS IN METAL-SIO2/SI DEVICES
[J].
CHIN, MR
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
CHIN, MR
;
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
MA, TP
.
APPLIED PHYSICS LETTERS,
1983,
42
(10)
:883
-885
[6]
USE OF CHARGE PUMPING CURRENTS TO MEASURE SURFACE STATE DENSITIES IN MOS-TRANSISTORS
[J].
ELLIOT, ABM
论文数:
0
引用数:
0
h-index:
0
机构:
PO RES DEPT, MARTLESHAM HEATH, IPSWICH, ENGLAND
PO RES DEPT, MARTLESHAM HEATH, IPSWICH, ENGLAND
ELLIOT, ABM
.
SOLID-STATE ELECTRONICS,
1976,
19
(03)
:241
-247
[7]
DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E)
[J].
GRAY, PV
论文数:
0
引用数:
0
h-index:
0
GRAY, PV
;
BROWN, DM
论文数:
0
引用数:
0
h-index:
0
BROWN, DM
.
APPLIED PHYSICS LETTERS,
1966,
8
(02)
:31
-&
[8]
A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS
[J].
GROESENEKEN, G
论文数:
0
引用数:
0
h-index:
0
GROESENEKEN, G
;
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
BELTRAN, N
论文数:
0
引用数:
0
h-index:
0
BELTRAN, N
;
DEKEERSMAECKER, RF
论文数:
0
引用数:
0
h-index:
0
DEKEERSMAECKER, RF
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(01)
:42
-53
[9]
A QUASI-STATIC TECHNIQUE FOR MOS C-V AND SURFACE STATE MEASUREMENTS
[J].
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
.
SOLID-STATE ELECTRONICS,
1970,
13
(06)
:873
-+
[10]
PARAMAGNETIC TRIVALENT SILICON CENTERS IN GAMMA-IRRADIATED METAL-OXIDE-SILICON STRUCTURES
[J].
LENAHAN, PM
论文数:
0
引用数:
0
h-index:
0
LENAHAN, PM
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
.
APPLIED PHYSICS LETTERS,
1984,
44
(01)
:96
-98
←
1
2
→
共 18 条
[1]
BOESCH HE, 1982, IEEE T NUCL SCI, V29, P1446
[2]
CHARGE PUMPING IN MOS DEVICES
[J].
BRUGLER, JS
论文数:
0
引用数:
0
h-index:
0
机构:
Stanford University, Stanford, Calif.
BRUGLER, JS
;
JESPERS, PGA
论文数:
0
引用数:
0
h-index:
0
机构:
Stanford University, Stanford, Calif.
JESPERS, PGA
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1969,
ED16
(03)
:297
-+
[3]
APPARENT INTERFACE STATE DENSITY INTRODUCED BY SPATIAL FLUCTUATIONS OF SURFACE POTENTIAL IN AN MOS STRUCTURE
[J].
CASTAGNE, R
论文数:
0
引用数:
0
h-index:
0
CASTAGNE, R
;
VAPAILLE, A
论文数:
0
引用数:
0
h-index:
0
VAPAILLE, A
.
ELECTRONICS LETTERS,
1970,
6
(22)
:691
-+
[4]
FREQUENCY AND TEMPERATURE TESTS FOR LATERAL NONUNIFORMITIES IN MIS CAPACITORS
[J].
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
CHANG, CC
;
JOHNSON, WC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
JOHNSON, WC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(10)
:1249
-1255
[5]
GATE-WIDTH DEPENDENCE OF RADIATION-INDUCED INTERFACE TRAPS IN METAL-SIO2/SI DEVICES
[J].
CHIN, MR
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
CHIN, MR
;
MA, TP
论文数:
0
引用数:
0
h-index:
0
机构:
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
MA, TP
.
APPLIED PHYSICS LETTERS,
1983,
42
(10)
:883
-885
[6]
USE OF CHARGE PUMPING CURRENTS TO MEASURE SURFACE STATE DENSITIES IN MOS-TRANSISTORS
[J].
ELLIOT, ABM
论文数:
0
引用数:
0
h-index:
0
机构:
PO RES DEPT, MARTLESHAM HEATH, IPSWICH, ENGLAND
PO RES DEPT, MARTLESHAM HEATH, IPSWICH, ENGLAND
ELLIOT, ABM
.
SOLID-STATE ELECTRONICS,
1976,
19
(03)
:241
-247
[7]
DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E)
[J].
GRAY, PV
论文数:
0
引用数:
0
h-index:
0
GRAY, PV
;
BROWN, DM
论文数:
0
引用数:
0
h-index:
0
BROWN, DM
.
APPLIED PHYSICS LETTERS,
1966,
8
(02)
:31
-&
[8]
A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS
[J].
GROESENEKEN, G
论文数:
0
引用数:
0
h-index:
0
GROESENEKEN, G
;
MAES, HE
论文数:
0
引用数:
0
h-index:
0
MAES, HE
;
BELTRAN, N
论文数:
0
引用数:
0
h-index:
0
BELTRAN, N
;
DEKEERSMAECKER, RF
论文数:
0
引用数:
0
h-index:
0
DEKEERSMAECKER, RF
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(01)
:42
-53
[9]
A QUASI-STATIC TECHNIQUE FOR MOS C-V AND SURFACE STATE MEASUREMENTS
[J].
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
.
SOLID-STATE ELECTRONICS,
1970,
13
(06)
:873
-+
[10]
PARAMAGNETIC TRIVALENT SILICON CENTERS IN GAMMA-IRRADIATED METAL-OXIDE-SILICON STRUCTURES
[J].
LENAHAN, PM
论文数:
0
引用数:
0
h-index:
0
LENAHAN, PM
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
.
APPLIED PHYSICS LETTERS,
1984,
44
(01)
:96
-98
←
1
2
→