DEPTH-PROFILING OF ORGANIC LAYERS ON MICROPARTICLES WITH SNMS

被引:3
|
作者
BENTZ, JWG [1 ]
EWINGER, HP [1 ]
GOSCHNICK, J [1 ]
KANNEN, G [1 ]
ACHE, HJ [1 ]
机构
[1] KERNFORSCHUNGSZENTRUM KARLSRUHE GMBH,INST RADIOCHEM,POSTFACH 3640,W-7500 KARLSRUHE 1,GERMANY
来源
关键词
D O I
10.1007/BF00321395
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Previous work on the quanti cation and localization of organically bound elements with plasma-based SNMS for the characterization of microparticles has been continued. Relative detection factors for 10 elements have been determined. Except for lead and bromine a principle proportionality to atomic ionization probabilities is shown. A moderate matrix dependence of less than 40% variation was found even when inorganic and organic materials are included. For depth calibration, erosion rates of organic materials were determined from the time interval necessary to sputter through planar single-layers and Langmuir-Blodgett multi-layer systems with known thickness, as well as from gravimetric powder measurements. Depth propagation rates were 0.7 nm . sec-1 for polymers and 2.3 nm . sec-1 for aromatic compounds, when 400 eV argon ion bombardment with 0.7 mA . cm-2 Was used. A depth resolution of approximately 30 nm has been obtained. Model particles of 5 mum size have been coated with fluoranthene. Inspection with SNMS revealed an incomplete coating covering only 20% of the microparticle surface with an average thickness of the partial coating of 300 nm. Subsequent characterization using laser-induced fluorimetry confirmed the amount of fluoranthene coating measured by SNMS.
引用
收藏
页码:123 / 127
页数:5
相关论文
共 50 条
  • [21] On the dynamic range in depth profiling with electron-gas SNMS
    Bock, W
    Kopnarski, M
    Oechsner, H
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1997, 358 (1-2): : 300 - 303
  • [22] BASIC STUDY OF NONDESTRUCTIVE OPTICAL DEPTH-PROFILING METHODS
    HARADA, M
    BUNSEKI KAGAKU, 1994, 43 (01) : 93 - 94
  • [23] On the dynamic range in depth profiling with electron-gas SNMS
    W. Bock
    M. Kopnarski
    H. Oechsner
    Fresenius' Journal of Analytical Chemistry, 1997, 358 : 300 - 303
  • [24] Analysis of Co/Cu multilayers by SNMS reverse depth profiling
    Csik, A.
    Vad, K.
    Langer, G. A.
    Katona, G. L.
    Toth-Kadar, E.
    Peter, L.
    VACUUM, 2009, 84 (01) : 141 - 143
  • [25] Depth-profiling analysis of ZnO layers with three morphologies by direct-current glow discharge mass spectrometry
    Huang, Lei
    Zeng, Wang
    Qian, Rong
    Zhuo, Shangjun
    Gu, Zheming
    Liu, Anqi
    Gao, Jie
    Chen, Qiao
    MICROCHEMICAL JOURNAL, 2023, 192
  • [26] High-Throughput Electrical Potential Depth-Profiling in Air
    Rietwyk, Kevin J.
    Keller, David A.
    Majhi, Koushik
    Ginsburg, Adam
    Priel, Maayan
    Barad, Hannah-Noa
    Anderson, Assaf Y.
    Zaban, Arie
    ADVANCED MATERIALS INTERFACES, 2017, 4 (16):
  • [27] INSITU DEPTH-PROFILING OF DEUTERIUM IN NICKEL EXPOSED TO RF PLASMA
    TAKAGI, I
    MATSUOKA, M
    FUJITA, H
    SHIN, K
    HIGASHI, K
    JOURNAL OF NUCLEAR MATERIALS, 1991, 179 : 319 - 321
  • [28] OXYGEN-INDUCED SEGREGATION EFFECTS IN SPUTTER DEPTH-PROFILING
    HUES, SM
    WILLIAMS, P
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 15 (1-6): : 206 - 209
  • [29] ION-BEAM DEPTH-PROFILING STUDIES OF LEACHED GLASSES
    HOUSER, CA
    TSONG, IST
    WHITE, WB
    WINTENBERG, AL
    MILLER, PD
    MOAK, CD
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1982, 64 (1-4): : 103 - 108
  • [30] DEPTH-PROFILING OF METAL-OXIDE FILMS PREPARED WITH MOCVD
    SEO, M
    TAKEMASA, K
    SATO, N
    APPLIED SURFACE SCIENCE, 1988, 33-4 : 120 - 128