DECOMPOSITION EQUILIBRIUM OF ARSINE AND LOW-PRESSURE DOPING OF EPITAXIAL CVD SILICON

被引：10

作者：

KOKOVIN, GA ^{[1
]}

TESTOVA, NA ^{[1
]}

TITOV, AA ^{[1
]}

MORGENSTERN, T ^{[1
]}

KUHNE, H ^{[1
]}

机构：

[1] AKAD WISSENSCH DDR,INST HALBLEITERPHYS,DDR-1200 FRANKFURT,GER DEM REP

来源：

CRYSTAL RESEARCH AND TECHNOLOGY | 1985年 / 20卷 / 12期

关键词：

D O I：

10.1002/crat.2170201206

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

收藏

页码：1583 / 1593

页数：11

相关论文

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