ELECTRON-BEAM-RESIST MATERIALS WITH ENHANCED DRY ETCH RESISTANCE

被引：5

作者：

AFFROSSMAN, S ^{[1
]}

ANGADJI, H ^{[1
]}

BAKHSHAEE, M ^{[1
]}

COFFEY, K ^{[1
]}

CHOW, FL ^{[1
]}

HAYWARD, D ^{[1
]}

MCLEOD, GG ^{[1
]}

PETHRICK, RA ^{[1
]}

WHITTAKER, P ^{[1
]}

机构：

[1] UNIV STRATHCLYDE,DEPT PURE & APPL CHEM,CATHEDRAL ST,GLASGOW G1 1XL,SCOTLAND

来源：

POLYMER | 1989年 / 30卷 / 06期

关键词：

D O I：

10.1016/0032-3861(89)90073-6

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：1022 / 1026

页数：5

共 12 条

[1]

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[2]

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[4] A NEW CLASS OF POSITIVE ELECTRON-BEAM RESISTS - METHYL-METHACRYLATE STYRENE AND BUTYL METHACRYLATE STYRENE COMB COPOLYMERS [J].

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HAYWARD, D ;

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SHERRINGTON, DC ;

PETHRICK, RA .

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[5]

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[6]

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[8] HIGH-RESOLUTION, STEEP PROFILE RESIST PATTERNS [J].

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[9] POLYMER DEGRADATION IN REACTIVE-GAS PLASMAS [J].

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[10]

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