DIFFRACTION CHARACTERISTICS OF PHOTORESIST SURFACE-RELIEF GRATINGS

被引：52

作者：

MOHARAM, MG ^{[1
]}

GAYLORD, TK ^{[1
]}

SINCERBOX, GT ^{[1
]}

WERLICH, H ^{[1
]}

YUNG, B ^{[1
]}

机构：

[1] IBM CORP,RES LABS,SAN JOSE,CA 95193

来源：

APPLIED OPTICS | 1984年 / 23卷 / 18期

关键词：

D O I：

10.1364/AO.23.003214

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：3214 / 3220

页数：7

共 17 条

[1]

[Anonymous], 1982, DIFFRACTION GRATINGS

[2] CHARACTERISTICS OF RELIEF PHASE HOLOGRAMS RECORDED IN PHOTORESISTS [J].

BARTOLINI, RA .

APPLIED OPTICS, 1974, 13 (01) :129-139

[3] HIGH-FREQUENCY HOLOGRAPHIC TRANSMISSION GRATINGS IN PHOTORESIST [J].

ENGER, RC ;

CASE, SK .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1983, 73 (09) :1113-1118

[4] OPTICAL-ELEMENTS WITH ULTRAHIGH SPATIAL-FREQUENCY SURFACE CORRUGATIONS [J].

ENGER, RC ;

CASE, SK .

APPLIED OPTICS, 1983, 22 (20) :3220-3228

[5]

GALE MT, 1980, SURFACE RELIEF IMAGE

[6]

GAYLORD TK, 1981, APPL OPT, V19, P3271

[7] CHARACTERISTICS OF A PHOTORESIST HOLOGRAM AND ITS REPLICA [J].

IWATA, F ;

TSUJIUCHI, J .

APPLIED OPTICS, 1974, 13 (06) :1327-1336

[8] COUPLED WAVE THEORY FOR THICK HOLOGRAM GRATINGS [J].

KOGELNIK, H .

BELL SYSTEM TECHNICAL JOURNAL, 1969, 48 (09) :2909-+

[9]

KRAMER CJ, 1982, P SOC PHOTO-OPT INST, V390, P165

[10] HOLOGRAPHIC RECORDING MATERIALS - REVIEW [J].

KURTZ, RL ;

OWEN, RB .

OPTICAL ENGINEERING, 1975, 14 (05) :393-401

← 1 2 →