ELECTRON-BEAM SENSITIVITY AND CONTRAST OF HALOGENATED POLYSTYRENE RESISTS

被引：0
|
作者：
JENSEN, JE [1 ]
BRAULT, RG [1 ]
MILLER, LJ [1 ]
GRANGER, DD [1 ]
VANAST, CI [1 ]
机构：
[1] HUGHES RES LABS,MALIBU,CA 90265
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 06期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C233 / C233
页数：1
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