HIGH-RESOLUTION MEASUREMENT OF THE STEP DISTRIBUTION AT THE SI/SIO2 INTERFACE

被引：16
作者：
HENZLER, M
MARIENHOFF, P
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 03期
关键词：
D O I：
10.1116/1.582821
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：346 / 348
页数：3
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