PLASMA ANALYSIS BY EXTREME ULTRAVIOLET SPECTROSCOPY

被引：0
|
作者：
MARKS, CL
SAYLOR, WP
STERK, AA
机构：
来源：
APPLIED SPECTROSCOPY | 1967年 / 21卷 / 06期
关键词：
D O I：
暂无
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：414 / &
相关论文
共 50 条
  • [21] INTENSITY MEASUREMENTS OF EXTREME ULTRAVIOLET-RADIATION FROM HELIUM PLASMA BY PHOTOELECTRON-SPECTROSCOPY
    SATO, K
    SUGAWARA, H
    ODA, T
    HOSOKAWA, M
    ISHII, K
    SASAKI, T
    PHYSICS LETTERS A, 1976, 58 (05) : 310 - 312
  • [22] Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy
    Watanabe, T
    Kinoshita, H
    Nii, H
    Hamamoto, K
    Tsubakino, H
    Hada, H
    Komano, H
    Irie, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03): : 736 - 742
  • [23] Ultraviolet and extreme ultraviolet spectroscopy of the solar corona at the Naval Research Laboratory
    Moses, J. D.
    Ko, Y. -K.
    Laming, J. M.
    Provornikova, E. A.
    Strachan, L.
    Beltran, S. Tun
    APPLIED OPTICS, 2015, 54 (31) : F222 - F231
  • [24] In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources
    Elg, Daniel T.
    Sporre, John R.
    Panici, Gianluca A.
    Srivastava, Shailendra N.
    Ruzic, David N.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (02):
  • [25] Plasma characterization in the extreme ultraviolet spectral range
    Kranzusch, S
    Mann, KR
    Peth, C
    ADVANCES IN LABORATORY-BASED X-RAY SOURCES AND OPTICS III, 2002, 4781 : 1 - 9
  • [26] Extreme ultraviolet plasma source for future lithography
    Wagenaars, Erik
    Mader, Arnaud
    Bergmann, Klaus
    Jonkers, Jeroen
    Neff, Willi
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2008, 36 (04) : 1280 - 1281
  • [27] Imaging with plasma based extreme ultraviolet sources
    Juschkin, Larissa
    SHORT-WAVELENGTH IMAGING AND SPECTROSCOPY SOURCES, 2012, 8678
  • [28] Pinch plasma radiation sources for the extreme ultraviolet
    Neff, W
    Bergmann, K
    Rosier, O
    Lebert, R
    Juschkin, L
    CONTRIBUTIONS TO PLASMA PHYSICS, 2001, 41 (06) : 589 - 597
  • [29] Extreme ultraviolet high-harmonic spectroscopy of solids
    Luu, T. T.
    Garg, M.
    Kruchinin, S. Yu.
    Moulet, A.
    Hassan, M. Th.
    Goulielmakis, E.
    NATURE, 2015, 521 (7553) : 498 - 502
  • [30] Extreme-ultraviolet Ramsey-type spectroscopy
    Pirri, Angela
    Sali, Emiliano
    Corsi, Chiara
    Bellini, Marco
    Cavalieri, Stefano
    Eramo, Roberto
    PHYSICAL REVIEW A, 2008, 78 (04):
12345